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Referenced Standards and Documents
and recommendations for developing design bases
where the metal detection limits are 108 to 1010 atoms/cm2
6900 or email your request to customerservice@semi
E This Standard was editorially modified in make corrections that were approved outside of the normal reapproval process
M00400 - SEMI M4 - Specifications for SOS Epitaxial Wafers Revision:SEMI M4-1103 (Withdrawn 0307) - Withdrawn - Historical Referenced Standards and DocumentsThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on November 21, 2006. It was available at www. semi. org in February 2007. Originally published in 1978; previously published November 2003. NOTICE: This document was balloted and approved for withdrawal in 2007. These specifications cover requirements for monocrystalline silicon epitaxial